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Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)

by Alfred Kwok-Kit Wong

ISBN 0819439959 / 9780819439956 / 0-8194-3995-9
Publisher SPIE Publications
Language English
Edition Softcover
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Book summary

This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.

Contents

- Foreword
- Preface
- List of symbols
- Introduction
- Optical imaging and resolution
- Modified illumination
- Optical proximity correction
- Alternating phase-shifting mask
- Attenuated phase-shift mask
- Selecting appropriate RETs
- Second-generation RETs
- Concluding remarks
- k1 conversion charts
- Bibliography
- Index [via]